Physical vapor deposition methods for fabricating dielectric gratings
Date
2017
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Publisher
University of Delaware
Abstract
There are many tools necessary in the construction of structures utilizing nanofabrication processes. Some of these tools are subtractive, such as etching which removes material from the device. Others are additive such as electroplating, chemical vapor deposition, and physical vapor deposition. This thesis will thoroughly explore two common physical deposition methods, Evaporation and Sputtering. These methods are used in our labs to deposit metals, semiconductors, and insulators. These processes are highly system dependent and require in depth process development and system understanding. To fully explain the physical vapor deposition techniques used for construction of many devices, the physical and mechanical processes will be discussed as well as the standard operating procedures required for operating the three physical deposition systems in the Electrical and Computer Engineering clean room located in DuPont Hall at the University of Delaware. These systems were used to deposit clean, uniform, and precise films of optical dielectric material to form candidate nano-scale profiles, which for the purpose of illustration consist of gratings in this thesis.
Description
Keywords
Pure sciences, Applied sciences, Deposition, Dielectric, Fabricating, Gratings, Physical vapor deposition, Vapor