Physical vapor deposition methods for fabricating dielectric gratings

Author(s)McElhiney, Morgan Edward
Date Accessioned2018-05-24T13:25:14Z
Date Available2018-05-24T13:25:14Z
Publication Date2017
SWORD Update2018-02-22T17:28:21Z
AbstractThere are many tools necessary in the construction of structures utilizing nanofabrication processes. Some of these tools are subtractive, such as etching which removes material from the device. Others are additive such as electroplating, chemical vapor deposition, and physical vapor deposition. This thesis will thoroughly explore two common physical deposition methods, Evaporation and Sputtering. These methods are used in our labs to deposit metals, semiconductors, and insulators. These processes are highly system dependent and require in depth process development and system understanding. To fully explain the physical vapor deposition techniques used for construction of many devices, the physical and mechanical processes will be discussed as well as the standard operating procedures required for operating the three physical deposition systems in the Electrical and Computer Engineering clean room located in DuPont Hall at the University of Delaware. These systems were used to deposit clean, uniform, and precise films of optical dielectric material to form candidate nano-scale profiles, which for the purpose of illustration consist of gratings in this thesis.en_US
AdvisorPrather, Dennis W.
DegreeM.S.
DepartmentUniversity of Delaware, Department of Electrical and Computer Engineering
Unique Identifier1037274038
URLhttp://udspace.udel.edu/handle/19716/23460
Languageen
PublisherUniversity of Delawareen_US
URIhttps://search.proquest.com/docview/2025487244?accountid=10457
KeywordsPure sciencesen_US
KeywordsApplied sciencesen_US
KeywordsDepositionen_US
KeywordsDielectricen_US
KeywordsFabricatingen_US
KeywordsGratingsen_US
KeywordsPhysical vapor depositionen_US
KeywordsVaporen_US
TitlePhysical vapor deposition methods for fabricating dielectric gratingsen_US
TypeThesisen_US
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