Design optimization of the double delta doping HEMT

Author(s)Lee, Mincheol
Date Accessioned2019-03-06T15:51:07Z
Date Available2019-03-06T15:51:07Z
Publication Date2018
SWORD Update2018-09-13T22:22:36Z
AbstractIn this thesis, the DC performance of the high-electron mobility transistor (HEMT) on GaAs substrate is studied based on a Sentaurus TCAD simulation. Poisson's equation, carrier temperature, and carrier continuity equations are included in the hydrodynamic model, and higher order effects such as electron velocity saturation and velocity overshoot are considered. The impact of double delta-doping layers on device performances are discussed. Further optimization methods like buried source and drain structure and channel compositions are proposed. It shows that the Off-current is reduced by 50% at a low drain bias and the On-current is increased by 26% at a high drain voltage bias.en_US
AdvisorZeng, Yuping
DegreeM.S.
DepartmentUniversity of Delaware, Department of Electrical and Computer Engineering
Unique Identifier1089256448
URLhttp://udspace.udel.edu/handle/19716/24088
Languageen
PublisherUniversity of Delawareen_US
URIhttps://search.proquest.com/docview/2158402368?accountid=10457
TitleDesign optimization of the double delta doping HEMTen_US
TitleDesign optimization of the double delta-doping HEMTen_US
TypeThesisen_US
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